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Polishing Slurry（Al₂O₃）

Polishing Slurry（Al₂O₃） is a colloidal silica slurry developed especially for polishing ceramics, and electronic substrates such as lithium tantalate (LiTaO3), lithium niobate (LiNbO3), and'Glass Photomask, Ferrite Ceramics, Ni-P Disk, Crystal, PZT Ceramics, Barium Titanate Ceramics, Bare Silicon , Alumina Ceramics, CaF2, Bare Silicon Wafer Rework, SiC Ceramics, Sapphire, Electronic Substrates, Ceramics ,Crystal. With excellent particle uniformity and dispersal, it delivers a high removal rate and damage-free polishing.

Wafer polisher/CMP MACHINES

Applicable to Sapphire or SIC super-hardcover material polishing process, man-machine interface to facilitate the operation, the body to strengthen the support bar design, higher stability, with water cooling function.

Silicon Carbide Wafer Thinning Machine

Silicon Carbide Wafer Thinning Machine is mainly used for thinning of substrate materials such as silicon wafer, gallium arsenide, silicon carbide ceramics, zirconia ceramics, graphite, lithium tantalate and so on.

Mirror Finish Polishing Machine for Stainless Steel

It is suitable for surface grinding of high-precision large workpieces. Such as: plastic plate, ceramic, nickel alloy, zinc alloy plate, tungsten steel plate, aluminum alloy, stainless steel, engine case, light guide plate, etc.

16B Double-Sided Lapping/Polishing Machine

What Double Side Lapping Machines can do？ Applicable to thin hard and brittle materials such as metal sealing rings, sapphire, SiC, ceramics, glass grinding and polishing process, four-stage pressure control, to avoid damage to the processing of materials.

Wafer & Semiconductor Polishing Slurry

Wafer & semiconductor polishing slurry is a colloidal silica slurry developed especially for polishing ceramics, and electronic substrates such as lithium tantalate (LiTaO3), lithium niobate (LiNbO3), and'Glass Photomask, Ferrite Ceramics, Ni-P Disk, Crystal, PZT Ceramics, Barium Titanate Ceramics, Bare Silicon , Alumina Ceramics, CaF2, Bare Silicon Wafer Rework, SiC Ceramics, Sapphire, Electronic Substrates, Ceramics ,Crystal. With excellent particle uniformity and dispersal, it delivers a high removal rate and damage-free polishing.

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